Ion-beam lithography: A promising technique for the patterning of graphene oxide foil

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389005%3A_____%2F18%3A00495721" target="_blank" >RIV/61389005:_____/18:00495721 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1063/1.5053388" target="_blank" >http://dx.doi.org/10.1063/1.5053388</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.5053388" target="_blank" >10.1063/1.5053388</a>

Result language
angličtina
Original language name
Ion-beam lithography: A promising technique for the patterning of graphene oxide foil
Original language description
Selective deoxygenation of graphene oxide has been conducted with regard with the design and fabrication of graphene based devices. The ion beam lithography is considered to be a powerful method for patterning onto graphene oxide foil. A helium beam has been used for both direct patterning onto graphene oxide foil and simultaneous online characterisation of its structural and compositional changes. Scanning electron microscopy, energy dispersive spectroscopy and Rutherford backscattering spectrometry analyses have been accurately employed to reveal and monitor the deoxygenation of the graphene oxide foil demonstrating the reliability of the direct patterning using the ion beam lithography technique.
Czech name
—
Czech description
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Similar results(10)