XUV Source Based on the Fast High-Current Capillary-Discharge System

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F14%3A00453286" target="_blank" >RIV/61389021:_____/14:00453286 - isvavai.cz</a>
Result on the web
<a href="https://ieeexplore.ieee.org/document/7287283" target="_blank" >https://ieeexplore.ieee.org/document/7287283</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1109/IPMHVC.2014.7287283" target="_blank" >10.1109/IPMHVC.2014.7287283</a>

Result language
angličtina
Original language name
XUV Source Based on the Fast High-Current Capillary-Discharge System
Original language description
Our aim is to achieve lasing at 13.4 nm, using excited H-like N ions. The primary pumping process is a three-body collisional recombination one. Nowadays, the fast high-current capillary-discharge experiments with nitrogen-filled capillary are in progress. In this paper the recent results obtained from CAPEX discharge system will be presented (e.g. electrical and XUV characteristics of nitrogen plasma discharge).
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 2014 IEEE International Power Modulator and High Voltage Conference, IPMHVC 2014
ISBN
978-1-4673-7323-4
ISSN
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e-ISSN
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Number of pages
3
Pages from-to
360-362
Publisher name
IEEE, Institute of Electrical and Electronics Engineers Inc
Place of publication
Santa Fe
Event location
Santa Fe
Event date
Jun 1, 2014
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000370659000091

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