The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F20%3A00541267" target="_blank" >RIV/61389021:_____/20:00541267 - isvavai.cz</a>

Result on the web

<a href="http://ijpest.com/Contents/14/1/e01008.html" target="_blank" >http://ijpest.com/Contents/14/1/e01008.html</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.34343/ijpest.2020.14.e01008" target="_blank" >10.34343/ijpest.2020.14.e01008</a>

Result language

angličtina

Original language name

The effects of pulse frequency on chemical species formation in a nanosecond pulsed plasma gas-liquid film reactor

Original language description

The influence of pulse frequency (1−60 kHz) in a nanosecond filamentary discharge propagating along a flowing liquid water film was assessed with regards to the formation of chemical species with argon and helium carrier gasses. The production rate and energy yield for H2O2 and H2 were measured for both carrier gases, and O2 formation was determined for helium. The effect of pulse frequency on the energy dissipated per pulse as well as electron density was also investigated. The results indicate that the energy yield for H2O2 decreases with increasing pulse frequency while the energy yields of H2 and O2 remain relatively unaffected. It is proposed that the difference in the trends of the liquid versus gas phase products can be attributed to the significantly longer residence time of the liquid phase allowing for more degradation of formed hydrogen peroxide before it is able exit the reactor.

Czech name

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Czech description

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Type

J_SC - Article in a specialist periodical, which is included in the SCOPUS database

CEP classification

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OECD FORD branch

10305 - Fluids and plasma physics (including surface physics)

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2020

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

International Journal of Plasma Environmental Science and Technology

ISSN

1881-8692

e-ISSN

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Volume of the periodical

14

Issue of the periodical within the volume

1

Country of publishing house

JP - JAPAN

Number of pages

9

Pages from-to

1-9

UT code for WoS article

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EID of the result in the Scopus database

2-s2.0-85085592924