Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61389021%3A_____%2F23%3A00584201" target="_blank" >RIV/61389021:_____/23:00584201 - isvavai.cz</a>
Result on the web
<a href="https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12579/2660115/Electron-injection-on-steep-ramp-up-plasma-density-profiles-in/10.1117/12.2660115.short" target="_blank" >https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12579/2660115/Electron-injection-on-steep-ramp-up-plasma-density-profiles-in/10.1117/12.2660115.short</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2660115" target="_blank" >10.1117/12.2660115</a>
Alternative languages
Result language
angličtina
Original language name
Electron injection on steep ramp-up plasma density profiles in high repetition rate laser-plasma wake-field accelerators
Original language description
Electron acceleration by laser pulses with high repetition rate can be used for technical applications. To reach conditions for the wake-field laser acceleration, it was demonstrated recently in experiments that it is beneficial to use near single cycle laser drive pulses with sub-4 fs duration, with narrow waists. To explore possible electron density ramp-up injection as an alternative to ramp-down and ionization injections, we performed numerical simulations of electron bunches generation in the ramp-up region. The PIC code Epoch2D and input parameters near to experiments were used. We assumed thin plasma slabs with super Gaussian density profiles of order 4-80, FWHM about 30 μm. We found that density ramp-up injected bunches can have charges several times higher than those obtained by ionization injection. There can be created a group of up to ten bunches in a sequence of bubbles, with not too mutually different maximum energy and charges. At oblique incidence of drive pulses on steep ramp up profiles, we find significant enhancement of the first bunch charge. For large slant angles45 or 45 degrees, the bunch charge enhancement is about twenty times. We conclude that the ramp-up injection can be a useful alternative injection on steep enough density profiles.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of SPIE - The International Society for Optical Engineering
ISBN
978-151066552-1
ISSN
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e-ISSN
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Number of pages
16
Pages from-to
"Roč. 12579 (2023)"
Publisher name
SPIE
Place of publication
Bellingham
Event location
Praha
Event date
Apr 25, 2023
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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