Nondestructive measurement of thickness of silicon oxide thin film on silicon substrate
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27350%2F06%3A00016822" target="_blank" >RIV/61989100:27350/06:00016822 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Nondestructive measurement of thickness of silicon oxide thin film on silicon substrate
Original language description
Nondestructive measurement of thickness of silicon oxide thin film on silicon substrate
Czech name
Nedestruktivní měření tloušťky oxidu křemíku na substrátu křemíku
Czech description
Nedestruktivní měření tloušťky oxidu křemíku na substrátu křemíku
Classification
Type
D - Article in proceedings
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA202%2F06%2F0531" target="_blank" >GA202/06/0531: Reflection and waveguiding effects in magnetic nanostructures</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2006
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Development of Materials Science in Research and Education
ISBN
80-901748-7-6
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
38-39
Publisher name
Czech and Slovak Crystallographic Association Praha
Place of publication
Valtice
Event location
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Event date
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Type of event by nationality
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UT code for WoS article
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