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Nondestructive measurement of thickness of silicon oxide thin film on silicon substrate

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27350%2F06%3A00016822" target="_blank" >RIV/61989100:27350/06:00016822 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Nondestructive measurement of thickness of silicon oxide thin film on silicon substrate

  • Original language description

    Nondestructive measurement of thickness of silicon oxide thin film on silicon substrate

  • Czech name

    Nedestruktivní měření tloušťky oxidu křemíku na substrátu křemíku

  • Czech description

    Nedestruktivní měření tloušťky oxidu křemíku na substrátu křemíku

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BH - Optics, masers and lasers

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/GA202%2F06%2F0531" target="_blank" >GA202/06/0531: Reflection and waveguiding effects in magnetic nanostructures</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2006

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    Development of Materials Science in Research and Education

  • ISBN

    80-901748-7-6

  • ISSN

  • e-ISSN

  • Number of pages

    2

  • Pages from-to

    38-39

  • Publisher name

    Czech and Slovak Crystallographic Association Praha

  • Place of publication

    Valtice

  • Event location

  • Event date

  • Type of event by nationality

  • UT code for WoS article