White-light spectral interferometry and reflectometry to measure thickness of thin films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27350%2F09%3A00021759" target="_blank" >RIV/61989100:27350/09:00021759 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

White-light spectral interferometry and reflectometry to measure thickness of thin films

Original language description

A white-light spectral interferometric technique and reflectometry are used for measuring the thickness of a SiO2 thin film grown by thermal oxidation on a Si substrate is presented.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Proceedings of SPIE

ISBN

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ISSN

0277-786X

e-ISSN

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Number of pages

8

Pages from-to

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Publisher name

SPIE - The International Society for Optical Engineering

Place of publication

Bellingham

Event location

Mnichov, Německo

Event date

Jun 15, 2009

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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