Modeling of Mueller Matrix Response from Diffracting Structures

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F61989100%3A27640%2F16%3A86098053" target="_blank" >RIV/61989100:27640/16:86098053 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1166/jnn.2016.12553" target="_blank" >http://dx.doi.org/10.1166/jnn.2016.12553</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1166/jnn.2016.12553" target="_blank" >10.1166/jnn.2016.12553</a>

Result language

angličtina

Original language name

Modeling of Mueller Matrix Response from Diffracting Structures

Original language description

Mueller matrix ellipsometry becomes frequently used technique to characterize thin films, multilayers, nanostructures, and also more complex diffracting surfaces. Polarimetric study of new-generation solar cells with textured surfaces requires development of new modeling methods including phenomena as depolarization or s-p mode conversion. One of the effective modeling methods is calculation of the diffracted far field using diffraction integrals. This paper proposes a method to model ellipsometric and polarimetric response from an arbitrary diffracting element. We approximate the structure with the locally smooth piecewise surface with small surface curvature. The model neglects shadowing effect. The model is based on calculation of the complex amplitudes using the Fresnel-Kirchhoff diffraction integral of electromagnetic field near the surface. The surface can consist of arbitrary materials described by the complex refractive index or an arbitrary multilayer structure. The theory is demonstrated on reflection from a silicon substrate with silicon oxide layer in the form of the triangle with curved surface near edges.

Czech name

—

Czech description

—

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BH - Optics, masers and lasers

OECD FORD branch

—

Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2016

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of nanoscience and nanotechnology

ISSN

1533-4880

e-ISSN

—

Volume of the periodical

16

Issue of the periodical within the volume

8

Country of publishing house

US - UNITED STATES

Number of pages

5

Pages from-to

7805-7809

UT code for WoS article

000387083900007

EID of the result in the Scopus database

2-s2.0-84979084515