Atmospheric Pressure Chemical Vapour Deposition of Polycarbosilane Films Via UV Laser Polymerization of Ethynyltrimethylsilane.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F02%3A27013069" target="_blank" >RIV/67985858:_____/02:27013069 - isvavai.cz</a>

Alternative codes found

RIV/67985858:_____/02:27020051

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Atmospheric Pressure Chemical Vapour Deposition of Polycarbosilane Films Via UV Laser Polymerization of Ethynyltrimethylsilane.

Original language description

ArF laser-induced polymerization of gaseous ethynyltrimethylsilane at atmospheric pressure of He represents a convenient way of efficient chemical vapour deposition of polycarbosilane films. The films are produced at ambient temperature of metals, quartzand glass, and are adhesive to these substrates, which makes this process promising for fabrication of protective coatings on thermally unstable surfaces.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CH - Nuclear and quantum chemistry, photo chemistry

OECD FORD branch

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Project

<a href="/en/project/ME%20192" target="_blank" >ME 192: Laser chemistry for production of novel materials</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Volume of the periodical

149

Issue of the periodical within the volume

2-3

Country of publishing house

CH - SWITZERLAND

Number of pages

6

Pages from-to

129-134

UT code for WoS article

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EID of the result in the Scopus database

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