Additive Injekt Pattering of Semiconductoring and UV-Absorbing Layer Stacks

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F67985858%3A_____%2F12%3A00393481" target="_blank" >RIV/67985858:_____/12:00393481 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Additive Injekt Pattering of Semiconductoring and UV-Absorbing Layer Stacks

Original language description

These paper inpired futher cooperation of Brno and Prague teams resulting into a new project focusing onto the development of inject direct patternable titania coating based on the Prague team's original sol-gel reverse micelles dipcoated composition. Separate original research atricle giving detailed information on the sol development, optimization the photoexcitation properties of the TiO0 printed layers as well as on its photocatalytic aktivity have been published recently.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

CI - Industrial chemistry and chemical engineering

OECD FORD branch

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Project

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Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2012

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Proceedings

ISBN

978-80-7080-850-4

ISSN

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e-ISSN

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Number of pages

2

Pages from-to

15-16

Publisher name

Typo Design

Place of publication

Prague

Event location

Hnanice

Event date

Nov 28, 2012

Type of event by nationality

EUR - Evropská akce

UT code for WoS article

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