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X-ray scattering study of oxide precipitates in Cz-Si

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081723%3A_____%2F10%3A00421391" target="_blank" >RIV/68081723:_____/10:00421391 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    X-ray scattering study of oxide precipitates in Cz-Si

  • Original language description

    Two x-ray diffraction methods were used for characterization of the oxide precipitates in Czochralski silicon series of samples. The maping of the diffuse scattering around reciprocal lattice point in Bragg geometry and the simultaneous measurement of the diffracted and transmitted beam intensity in the Laue diffraction geometry.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    SILICON 2010. 12th Scientific and Business Conference

  • ISBN

    978-80-254-7361-0

  • ISSN

  • e-ISSN

  • Number of pages

    2

  • Pages from-to

  • Publisher name

    TECON Scientific, s.r.o.

  • Place of publication

    Rožnov pod Radhoštěm

  • Event location

    Rožnov pod Radhoštěm

  • Event date

    Nov 2, 2010

  • Type of event by nationality

    EUR - Evropská akce

  • UT code for WoS article