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Mechanical properties of ultrananocryslalline thin films deposited using dual frequency discharges

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081723%3A_____%2F11%3A00359836" target="_blank" >RIV/68081723:_____/11:00359836 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Mechanical properties of ultrananocryslalline thin films deposited using dual frequency discharges

  • Original language description

    The preparation of nanostructured (nanocomposite or nanocrystalline) diamond coatings is studied due to their extreme mechanical hardness and wear resistance, high bulk modulus, low compressibility, high thermal conductivity, low thermal expansion coefficient , broad optical transparency from the deep ultraviolet to the far infrared, high electrical resistivity, biocompatibility, etc. Their main advantage compared to the polycrystalline diamond film is, that they can be prepared with relatively low surface roughness. The mechanical properties such as hardness, fracture toughness, film-substrate adhesion and thermomechanical stability of the coating-substrate system play always a crucial role for industrial applications of the coatings. Therefore the main aim of the present work is to study the mechanical properties of ultrananocrystalline thin films using two different indentation techniques.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Chemické listy

  • ISSN

    0009-2770

  • e-ISSN

  • Volume of the periodical

    105

  • Issue of the periodical within the volume

  • Country of publishing house

    CZ - CZECH REPUBLIC

  • Number of pages

    4

  • Pages from-to

    98-101

  • UT code for WoS article

  • EID of the result in the Scopus database