Deformation mechanisms of Al thin films: In-situ TEM and molecular dynamics study
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081723%3A_____%2F22%3A00557624" target="_blank" >RIV/68081723:_____/22:00557624 - isvavai.cz</a>
Alternative codes found
RIV/00216208:11320/22:10446985
Result on the web
<a href="https://www.sciencedirect.com/science/article/pii/S1359646222001889?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S1359646222001889?via%3Dihub</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.scriptamat.2022.114688" target="_blank" >10.1016/j.scriptamat.2022.114688</a>
Alternative languages
Result language
angličtina
Original language name
Deformation mechanisms of Al thin films: In-situ TEM and molecular dynamics study
Original language description
Molecular dynamics (MD) is a simulation method regularly used for examining the mechanical properties of materials on an atomic level. Despite many reasonable results obtained by this method, it remains unclear how well an MD simulation can reproduce the results of a specific experiment. Thin aluminum-based films were deformed in-situ in a transmission electron microscope (TEM). Grain boundary processes were identified as the primary deformation mechanism, and grain rotations during deformation were confirmed by automatic orientation maps. Tensile deformation of Al-based thin films with columnar grains corresponding to the material structure observed in the experiment was then simulated using MD. Several main attributes of the simulation were found to match the experimental results. The effect of grain orientation on intragranular dislocation activity was observed by TEM and confirmed by MD simulations.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
21001 - Nano-materials (production and properties)
Result continuities
Project
<a href="/en/project/EF15_003%2F0000485" target="_blank" >EF15_003/0000485: Nanomaterials centre for advanced applications</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2022
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Scripta Materialia
ISSN
1359-6462
e-ISSN
1872-8456
Volume of the periodical
215
Issue of the periodical within the volume
JUL
Country of publishing house
GB - UNITED KINGDOM
Number of pages
6
Pages from-to
114688
UT code for WoS article
000791282900001
EID of the result in the Scopus database
2-s2.0-85127039949