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Defect-induced properties of MoSi2/Nb(Ta)Si2 disilicide nanocomposites

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081723%3A_____%2F24%3A00585935" target="_blank" >RIV/68081723:_____/24:00585935 - isvavai.cz</a>

  • Alternative codes found

    RIV/00216224:14310/24:00137179

  • Result on the web

    <a href="https://www.sciencedirect.com/science/article/pii/S2352492824005646?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S2352492824005646?via%3Dihub</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.mtcomm.2024.108584" target="_blank" >10.1016/j.mtcomm.2024.108584</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Defect-induced properties of MoSi2/Nb(Ta)Si2 disilicide nanocomposites

  • Original language description

    Research on disilicide nanocomposites, as modern materials with promising technological applications, is very desirable these days. Our ab initio analysis concentrates on the C11(b) (tetragonal) MoSi2/C40 (hexagonal) NbSi2 or TaSi2 nanocomposites containing 12 types of interfaces formed by (110) planes in the C11(b) and (0001) planes in the C40 disilicide. The most stable nanocomposites are MoSi2(AC)/Nb(Ta)Si-2(BAC), MoSi2(AB)/Nb(Ta)Si-2(CAB) and MoSi2(AB)/Nb(Ta)Si-2(ABC). The interfaces reveal positive formation energies, e.g. gamma(BA)(IF) = 0.63670 J.m(-2) and gamma(CA)(IF) = 0.63727 J.m(-2) in the Nb system and gamma(BA)(IF) = 0.57837 J.m(-2) and gamma(CA)(IF) = 0.57802 J.m(-2) in the Ta system. In the most stable C(11)b-MoSi2(AC)/C40-Nb(Ta)Si-2(BAC) nanocomposite, the effect of the impurities (Al, Si), vacancies or their aggregates on the stability and structure is investigated. It turns out that (i) vacancies preferentially form at the Si positions in the third (first) layer of MoSi2 in the Nb (Ta) systems, utilising an energy of 2.259 eV.Va(-1) (1.971 eV. Va(-1)), (ii) Al impurities prefer Si positions, and it is easier to introduce them into the Ta system than into the Nb one, however, this does not apply if Al is in the Mo position, (iii) Si impurities prefer Ta positions to Nb ones, and the bulk to interfacial ones, (iv) the Si-Si divacancy is the least destabilising among divacancies and (v) Al impurities in both systems prevent the formation of Si vacancies, and the Si impurities simplify the formation of vacancies in the Nb system. As there is very little experimental information on the structure and properties of these interfaces, most of the present results are theoretical predictions which may motivate future experimental work.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2024

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Materials Today Communications

  • ISSN

    2352-4928

  • e-ISSN

    2352-4928

  • Volume of the periodical

    39

  • Issue of the periodical within the volume

    Jun

  • Country of publishing house

    NL - THE KINGDOM OF THE NETHERLANDS

  • Number of pages

    13

  • Pages from-to

    108584

  • UT code for WoS article

    001215649600001

  • EID of the result in the Scopus database

    2-s2.0-85188679210