Modular Monte Carlo Simulation Including Secondary Electron Raytracing
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F08%3A00335886" target="_blank" >RIV/68081731:_____/08:00335886 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Modular Monte Carlo Simulation Including Secondary Electron Raytracing
Original language description
A Monte Carlo simulation program for the modeling of image formation in scanning electron microscopy is presented. A key feature of the program is its modular design, so the different aspects of image formation (i.e. forming of the electron probe, specimen topography model, probe-sample-interaction, electron detector model, image processing) are arranged in separate program modules. The program is written in C++ and uses object-oriented programming techniques. Data exchange between the different programmodules is performed by defined software interfaces. Thus, third party simulation code can easily be integrated into the program.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the 11th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation
ISBN
978-80-254-0905-3
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
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Publisher name
Institute of Scientific Instruments AS CR, v.v.i
Place of publication
Brno
Event location
Skalský dvůr
Event date
Jul 14, 2008
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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