Determination of proximity effect forward scattering range parameter in e-beam lithography

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F10%3A00350671" target="_blank" >RIV/68081731:_____/10:00350671 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—

Result language
angličtina
Original language name
Determination of proximity effect forward scattering range parameter in e-beam lithography
Original language description
Electron beam lithography (EBL) is a tool for generation patterns with high resolution, so it is necesessary to control critical dimensions of created patterns, because the undesired influence of adjacent regions to those exposed can occur due to the proximity effect. Proximity effect is often described by two Gaussian function, where .alpha. represents forward scattering range parameter. Consequently, we present evaluation of proximity parameter .alpha. by various method in this paper.
Czech name
—
Czech description
—

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of the 12th International Seminar on Recent Trends in Charged Particle Optics and Surface Physics Instrumentation
ISBN
978-80-254-6842-5
ISSN
—
e-ISSN
—
Number of pages
2
Pages from-to
—
Publisher name
Institute of Scientific Instruments AS CR, v.v.i
Place of publication
Brno
Event location
Skalský dvůr
Event date
May 31, 2010
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
—

Similar results(10)