Thin Metallic Layers Structured by E-beam Lithography

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F12%3A00387383" target="_blank" >RIV/68081731:_____/12:00387383 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Thin Metallic Layers Structured by E-beam Lithography
Original language description
The group of electron beam lithography runs the laboratory equipped with a shaped beam electron writer (BS600) and the basic technology for the lithographic process. The group is able to prepare micro and nano structures in thin layers of metals and other materials; including the characterization of the realized structures (using AFM, SEM, and CLSM). Within a few months (in the frame of the 'ALISI' project) a new e-beam writer with a better resolution will be installed; it will enable the realization ofthe actual structures in a better quality and the development of new structures with a very high innovation potential.
Czech name
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Czech description
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Project
<a href="/en/project/ED0017%2F01%2F01" target="_blank" >ED0017/01/01: APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
METAL 2012 Conference Proceedings. 21st International Conference on Metallurgy and Materials
ISBN
978-80-87294-29-1
ISSN
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e-ISSN
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Number of pages
6
Pages from-to
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Publisher name
TANGER Ltd
Place of publication
Ostrava
Event location
Brno
Event date
May 23, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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