Lift-Off technique using different e-beam writers

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F13%3A00429790" target="_blank" >RIV/68081731:_____/13:00429790 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Lift-Off technique using different e-beam writers
Original language description
This paper deals with lift–off technique performed by the way of electron beam lithography. Lift–off is a technique mainly used for preparation of metallic patterns and unlike etching it is an additive technique using a sacrificial material – e.g. e–beam resist PMMA. In this paper we discussed technique of preparation of lift–off mask on two different e–beam writing systems. The first system was BS600 – e–beam writer with rectangular variable shaped beam working with 15keV. The second system was Vistec EBPG5000+ HR – e–beam writer with Gaussian shape beam working with 50 keV and 100 keV. The PMMA resist single layer and bi–layer was used for the lift–off mask preparation. As a material for creation of metallic pattern, magnetron sputtered chromium was used. Atomic force microscope, scanning electron microscope and contact profilometer were used to measure and evaluate the results of this process.
Czech name
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Czech description
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
NANOCON 2013. 5th International Conference Proceedings
ISBN
978-80-87294-44-4
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
286-290
Publisher name
TANGER Ltd
Place of publication
Ostrava
Event location
Brno
Event date
Oct 16, 2013
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000352070900050

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