Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F16%3A00467179" target="_blank" >RIV/68081731:_____/16:00467179 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1088/1009-0630/18/4/17" target="_blank" >http://dx.doi.org/10.1088/1009-0630/18/4/17</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1088/1009-0630/18/4/17" target="_blank" >10.1088/1009-0630/18/4/17</a>

Result language

angličtina

Original language name

Influence of Chemical Precleaning on the Plasma Treatment Efficiency of Aluminum by RF Plasma Pencil

Original language description

This paper is aimed to show the influence of initial chemical pretreatment prior to subsequent plasma activation of aluminum surfaces. The results of our study showed that the state of the topmost surface layer (i.e. the surface morphology and chemical groups) of plasma modified aluminum significantly depends on the chemical precleaning. Commonly used chemicals (isopropanol, trichlorethane, solution of NaOH in deionized water) were used as precleaning agents. The plasma treatments were done using a radio frequency driven atmospheric pressure plasma pencil developed at Masaryk University, which operates in Ar, Ar/O-2 gas mixtures. The effectiveness of the plasma treatment was estimated by the wettability measurements, showing high wettability improvement already after 0.3 s treatment. The effects of surface cleaning (hydrocarbon removal), surface oxidation and activation (generation of OH groups) were estimated using infrared spectroscopy. The changes in the surface morphology were measured using scanning electron microscopy. Optical emission spectroscopy measurements in the near-to-surface region with temperature calculations showed that plasma itself depends on the sample precleaning procedure.

Czech name

—

Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

—

Project

—

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2016

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Science & Technology

ISSN

1009-0630

e-ISSN

—

Volume of the periodical

18

Issue of the periodical within the volume

4

Country of publishing house

CN - CHINA

Number of pages

8

Pages from-to

430-437

UT code for WoS article

000375143300017

EID of the result in the Scopus database

2-s2.0-84963752240