Methods of the electron induced cleanning in SEM
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F21%3A00551132" target="_blank" >RIV/68081731:_____/21:00551132 - isvavai.cz</a>
Result on the web
<a href="https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/methods-of-the-electron-induced-cleanning-in-sem/54D0340450B8B0BEA7DAD306BCE1C21B" target="_blank" >https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/methods-of-the-electron-induced-cleanning-in-sem/54D0340450B8B0BEA7DAD306BCE1C21B</a>
DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Methods of the electron induced cleanning in SEM
Original language description
A special technique was developed and tested to clean the specimen and to do the imaging of the individual graphene layers, or other 2D materials, in the standard vacuum conditions of the conventional SEM. Parameters such as the primary electron beam energy, electron dose, sample bias, and scanning rate have been optimized to find the equilibrium between electron stimulated desorption (cleaning) and deposition (contamination).
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
20201 - Electrical and electronic engineering
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů