A sampler of diffraction and refraction optically variable image elements
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68081731%3A_____%2F21%3A00564672" target="_blank" >RIV/68081731:_____/21:00564672 - isvavai.cz</a>
Alternative codes found
RIV/00007064:K01__/21:N0000122
Result on the web
<a href="https://www.confer.cz/nanocon/2021/4371-a-sampler-of-diffraction-and-refraction-optically-variable-image-elements" target="_blank" >https://www.confer.cz/nanocon/2021/4371-a-sampler-of-diffraction-and-refraction-optically-variable-image-elements</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.37904/nanocon.2021.4371" target="_blank" >10.37904/nanocon.2021.4371</a>
Alternative languages
Result language
angličtina
Original language name
A sampler of diffraction and refraction optically variable image elements
Original language description
Diffraction and refraction optically variable image elements are basic building blocks of planar structures for advanced security of documents and valuables. A sampler formed by an array of 36 diffraction structures binary, tertiary, quaternary and blazed gratings (period range 400 nm 20,000 nm) represents a cross-section throughout technological steps mastering, galvanic replication and embossing. Electron-beam writing technology with Gaussian beam and electron energy of 100 keV, with very small forward scattering of high energy electrons and with the possibilities to create a linear grating with the minimal period of 100 nm, was used to create the master. An important advantage of high-resolution electron-beam lithography is its substantial flexibility in combining possible planar structures with significantly different parameters, such as very dense and relatively shallow structures together with deep structures (approx. 10 microns) with precise shapes (micro-lenses or Fresnel structures). For protection of documents and valuables, interesting results are induced with planar optical structures consisting of non-periodic arrangements, which are characterized by high robustness to counterfeiting and imitation. While the origination process is available for grating period down to 100 nm, the mass replication technology appears to be a bottleneck of the entire technological process. Measurement of topology and profiles of the structures by atomic forces microscope and documenting the quality of technological process of the three steps of replication of planar optically variable elements was performed for all 36 structure types of sampler.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
21002 - Nano-processes (applications on nano-scale); (biomaterials to be 2.9)
Result continuities
Project
<a href="/en/project/VI20192022147" target="_blank" >VI20192022147: Diffractive and refractive optics for advanced document security</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
NANOCON 2021 - Conference proceedings
ISBN
978-80-88365-00-6
ISSN
2694-930X
e-ISSN
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Number of pages
6
Pages from-to
436-441
Publisher name
Tanger Ltd.
Place of publication
Ostrava
Event location
Brno
Event date
Oct 20, 2021
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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