Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F02%3A02020141" target="_blank" >RIV/68378271:_____/02:02020141 - isvavai.cz</a>

Alternative codes found

RIV/49777513:23520/02:00069656

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Composition, structure, microhardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering.

Original language description

W-Ti-N films were deposited by the reactive d.c. magnetron sputtering from W-Ti(30 at.) target in a mixture of argon and nitrogen at a total pressure of 0.5 Pa onto steel and silicon substrates.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

0040-6090

e-ISSN

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Volume of the periodical

408

Issue of the periodical within the volume

N/A

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

12

Pages from-to

136-147

UT code for WoS article

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EID of the result in the Scopus database

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