Influence of the additional RF discharge on the properties of carbon nitride thin films deposited by PLD.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F02%3A02020356" target="_blank" >RIV/68378271:_____/02:02020356 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Influence of the additional RF discharge on the properties of carbon nitride thin films deposited by PLD.

Original language description

Nitrogen-rich carbon nitride films were prepared by pulsed laser deposition combined with additional r.f. and hollow cathode discharge on fused silica, stainless steel and silicon substrates.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Advanced Laser Technologies.

ISBN

0-8194-4528-2

ISSN

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e-ISSN

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Number of pages

7

Pages from-to

118-124

Publisher name

SPIE - International Society for Optical Engineering

Place of publication

Bellingham

Event location

Constanta [RO]

Event date

Sep 11, 2001

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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