Atmospheric Barrier-Torch Discharge Applied on tke Low Temperature Deposition.
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F02%3A02020378" target="_blank" >RIV/68378271:_____/02:02020378 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Atmospheric Barrier-Torch Discharge Applied on tke Low Temperature Deposition.
Original language description
The barier-torch discharge was used for a low temperature deposition of In x O y and SnO x thin films at atmospheric pressure on polymer SiO 2 and Si substrates as well. Valpours of Sn- and In- acetylacetonat were used as growth precursors for the deposition process of SnO x and In x O y films respectvely.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2002
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Jemná mechanika a optika
ISSN
0447-6441
e-ISSN
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Volume of the periodical
11-12
Issue of the periodical within the volume
N/A
Country of publishing house
CZ - CZECH REPUBLIC
Number of pages
6
Pages from-to
381-386
UT code for WoS article
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EID of the result in the Scopus database
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