Crystallinity of the mixed phase silicon thin films by Raman spectroscopy
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F08%3A00309897" target="_blank" >RIV/68378271:_____/08:00309897 - isvavai.cz</a>
Alternative codes found
RIV/00216208:11320/08:00206082 RIV/68378271:_____/08:00341950
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Crystallinity of the mixed phase silicon thin films by Raman spectroscopy
Original language description
Raman spectra of the mixed phase silicon films were studied. The 785 nm excitation was found optimal for crystallinity evaluation.
Czech name
Krystalinita tenké vrstvy křemíku určená Ramanovou spektroskopií
Czech description
Studovali jsme Ramanova spektra směsní fází křemíku. Pro určení jejich krystalinity je optimální excitování spekter při 785 nm.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Non-Crystalline Solids
ISSN
0022-3093
e-ISSN
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Volume of the periodical
354
Issue of the periodical within the volume
19-25
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
5
Pages from-to
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UT code for WoS article
000256500400042
EID of the result in the Scopus database
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