Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F10%3A00346487" target="_blank" >RIV/68378271:_____/10:00346487 - isvavai.cz</a>
Alternative codes found
RIV/67985858:_____/10:00346487 RIV/60461373:22310/10:00023076
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Double hollow cathode plasma jet-low temperature method for the TiO2-xNx photoresponding films
Original language description
The low temperature double hollow cathode plasma jet method for producing photoresponding thin transparent layers of TiO2-xNx is reported. The RF power magnitude was identified as the parameter affecting substantially the photoinduced properties of the produced films.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Electrochimica acta
ISSN
0013-4686
e-ISSN
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Volume of the periodical
55
Issue of the periodical within the volume
5
Country of publishing house
GB - UNITED KINGDOM
Number of pages
9
Pages from-to
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UT code for WoS article
000275596900008
EID of the result in the Scopus database
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