Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00390533" target="_blank" >RIV/68378271:_____/12:00390533 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Comparison of the growth of ultrathin silver film by pulsed laser deposition and magnetron sputtering
Original language description
Silver thin films exhibit unusual properties and performances due to unique electrical and optical properties of silver. The films attract attention in eg. photonics, electronics, sensors and biophysics. Particular application requires the film of special morphology, ie. isolated nanoparticles, arrays, or smooth surface. It is important to choose proper deposition technique and understand mechanism of silver nucleation and growth to better control the film properties. Hence, we investigate and compare the growth of ultrathin silver film by pulsed laser deposition (PLD) and magnetron sputtering techniques. A silver target was ablated by a Nd:YAG laser operating at wavelength of 266 nm and pulse length of 4 ns in case of PLD. Silver RF magnetron sputtering was performed at power varied from 30 to 100 W. Both experiments were carried out in argon atmosphere of pressure varied from 0.5 to 3 Pa. We focus on in-situ monitoring of electrical and optical properties of the growing layer.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů