A new view of microcrystalline silicon: The role of plasma processing in achieving a dense and stable absorber material for photovoltaic applicationsv
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00390706" target="_blank" >RIV/68378271:_____/12:00390706 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/adfm.201200299" target="_blank" >http://dx.doi.org/10.1002/adfm.201200299</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/adfm.201200299" target="_blank" >10.1002/adfm.201200299</a>
Alternative languages
Result language
angličtina
Original language name
A new view of microcrystalline silicon: The role of plasma processing in achieving a dense and stable absorber material for photovoltaic applicationsv
Original language description
A qualitative model that explains how plasma processes act on the properties of ? c-Si:H and on the related solar cell performance is presented, evidencing the growth of two different material phases. The first phase, which gives signature for bulk defect density, can be obtained at high quality over a wide range of plasma process parameters and dominates cell performance on fl atsubstrates. The second phase, which consists of nanoporous 2D regions, typically appears when the material is grown on substrates with inappropriate roughness, and alters or even dominates the electrical performance of the device.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Advanced Functional Materials
ISSN
1616-301X
e-ISSN
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Volume of the periodical
22
Issue of the periodical within the volume
17
Country of publishing house
DE - GERMANY
Number of pages
7
Pages from-to
3665-3671
UT code for WoS article
000308329800017
EID of the result in the Scopus database
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