Fabrication of nanostructured boron doped diamond films for electrochemical applications

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F12%3A00398973" target="_blank" >RIV/68378271:_____/12:00398973 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Fabrication of nanostructured boron doped diamond films for electrochemical applications
Original language description
In this study two different concepts for fabrication of nanostructured boron-doped diamond (BDD) electrodes are presented: concept I includes overgrowing of structured intrinsic nanodiamond film by BDD layer and concept II uses a direct etching of BDD/i-NCD double layer deposited on Si substrates by reactive ion etching (RIE). As the masking material, self-organized Au nanodroplets are used. In the present article, technological steps as growth of diamond, electrode fabrication, as well as the formationof the metal nanodroplets mask and encapsulation of diamond electrodes are discussed.
Czech name
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Czech description
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Project
<a href="/en/project/GBP108%2F12%2FG108" target="_blank" >GBP108/12/G108: Preparation, modification and characterization of materials by radiation</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2012
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Progresívne materiály a vákuum ( Progressive materials and vacuum)
ISBN
978-80-971179-0-0
ISSN
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e-ISSN
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Number of pages
5
Pages from-to
53-57
Publisher name
Slovenská vakuová spolocnosť
Place of publication
Bratislava
Event location
Štrbské pleso
Event date
Nov 8, 2012
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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