Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00432261" target="_blank" >RIV/68378271:_____/14:00432261 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.7567/JJAP.53.05FP04" target="_blank" >http://dx.doi.org/10.7567/JJAP.53.05FP04</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.7567/JJAP.53.05FP04" target="_blank" >10.7567/JJAP.53.05FP04</a>
Alternative languages
Result language
angličtina
Original language name
Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system
Original language description
Growth of diamond coatings with tunable morphology and concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were studied. The dependence of plasma parameters on gas composition was studied by Langmuir probe measurement. Growndiamond coatings and carbon nanotubes were characterized by scanning electron microscopy and Raman spectroscopy and correlated with process parameters. Well-defined nanocrystalline, polycrystalline, and porous diamond films were prepared. Concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were shown.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Japanese Journal of Applied Physics
ISSN
0021-4922
e-ISSN
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Volume of the periodical
53
Issue of the periodical within the volume
5
Country of publishing house
JP - JAPAN
Number of pages
3
Pages from-to
"05FP04-1"-"05FP04-3"
UT code for WoS article
000338316200114
EID of the result in the Scopus database
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