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Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00432261" target="_blank" >RIV/68378271:_____/14:00432261 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.7567/JJAP.53.05FP04" target="_blank" >http://dx.doi.org/10.7567/JJAP.53.05FP04</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.7567/JJAP.53.05FP04" target="_blank" >10.7567/JJAP.53.05FP04</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

  • Original language description

    Growth of diamond coatings with tunable morphology and concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were studied. The dependence of plasma parameters on gas composition was studied by Langmuir probe measurement. Growndiamond coatings and carbon nanotubes were characterized by scanning electron microscopy and Raman spectroscopy and correlated with process parameters. Well-defined nanocrystalline, polycrystalline, and porous diamond films were prepared. Concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were shown.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2014

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Japanese Journal of Applied Physics

  • ISSN

    0021-4922

  • e-ISSN

  • Volume of the periodical

    53

  • Issue of the periodical within the volume

    5

  • Country of publishing house

    JP - JAPAN

  • Number of pages

    3

  • Pages from-to

    "05FP04-1"-"05FP04-3"

  • UT code for WoS article

    000338316200114

  • EID of the result in the Scopus database