Initial and secondary oxidation products on the Si(111)-(7x7) surface identified by atomic force microscopy and first principles calculations

Result code in IS VaVaI

RIV/68378271:_____/14:00432274 - isvavai.cz

Result on the web

http://dx.doi.org/10.1063/1.4870629

DOI - Digital Object Identifier

10.1063/1.4870629

Result language

angličtina

Original language name

Initial and secondary oxidation products on the Si(111)-(7x7) surface identified by atomic force microscopy and first principles calculations

Original language description

We investigated the initial and secondary oxidation products on the Si(111)-(7x7) surface at room temperature using atomic force microscopy (AFM), scanning tunneling microscopy (STM), and density functional theory calculations. We found the atomic structure of these products. The initial and secondary oxidation products appear as bright and dark sites, respectively, STM. It was shown that the topographic information given by AFM was close to the real atomic corrugation of the oxygen-containing structures on the semiconductor surfaces.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

GA14-02079S: Control of single electron charge states in molecules on surfaces

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2014

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Applied Physics Letters

ISSN

0003-6951

e-ISSN

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Volume of the periodical

104

Issue of the periodical within the volume

13

Country of publishing house

US - UNITED STATES

Number of pages

4

Pages from-to

"133107-1"-"133107-4"

UT code for WoS article

000334408500058

EID of the result in the Scopus database

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