Initial and secondary oxidation products on the Si(111)-(7x7) surface identified by atomic force microscopy and first principles calculations

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F14%3A00432274" target="_blank" >RIV/68378271:_____/14:00432274 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1063/1.4870629" target="_blank" >http://dx.doi.org/10.1063/1.4870629</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4870629" target="_blank" >10.1063/1.4870629</a>

Result language
angličtina
Original language name
Initial and secondary oxidation products on the Si(111)-(7x7) surface identified by atomic force microscopy and first principles calculations
Original language description
We investigated the initial and secondary oxidation products on the Si(111)-(7x7) surface at room temperature using atomic force microscopy (AFM), scanning tunneling microscopy (STM), and density functional theory calculations. We found the atomic structure of these products. The initial and secondary oxidation products appear as bright and dark sites, respectively, STM. It was shown that the topographic information given by AFM was close to the real atomic corrugation of the oxygen-containing structures on the semiconductor surfaces.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
<a href="/en/project/GA14-02079S" target="_blank" >GA14-02079S: Control of single electron charge states in molecules on surfaces</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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