On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F15%3A00449337" target="_blank" >RIV/68378271:_____/15:00449337 - isvavai.cz</a>
Alternative codes found
RIV/61989592:15310/15:33154405 RIV/60461373:22310/15:43900733
Result on the web
<a href="http://dx.doi.org/10.1016/j.apcatb.2014.10.015" target="_blank" >http://dx.doi.org/10.1016/j.apcatb.2014.10.015</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apcatb.2014.10.015" target="_blank" >10.1016/j.apcatb.2014.10.015</a>

Result language
angličtina
Original language name
On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method
Original language description
Iron oxide (α-Fe2O3) hematite films were prepared by a novel high-power impulse magnetron sputtering method (HiPIMS). Some of the crucial issues of hematite are a large overpotential needed to develop the water oxidation photocurrent onset, high extent of surface defects acting as traps, and a short diffusion length (2–4 nm) of photogenerated holes. We report on minimizing these limits by deposition of highly photoactive nanocrystalline very thin ( 30 nm) absorbing hematite films by HiPIMS and their passivation by ultra-thin ( 2 nm) atomic layer deposited (ALD) isocrystalline alumina oxide (α-Al2O3) films. A new approach of one-step annealing of this bilayer system is introduced. The films were judged on the basis of physical properties such as crystalline structure, optical absorption, surface topography, and electronic properties.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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