Atomic layer deposition for coating of high aspect ratio TiO2 nanotube layers

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F16%3A00464609" target="_blank" >RIV/68378271:_____/16:00464609 - isvavai.cz</a>
Alternative codes found
RIV/00216275:25310/16:39901702
Result on the web
<a href="http://dx.doi.org/10.1021/acs.langmuir.6b03119" target="_blank" >http://dx.doi.org/10.1021/acs.langmuir.6b03119</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1021/acs.langmuir.6b03119" target="_blank" >10.1021/acs.langmuir.6b03119</a>

Result language
angličtina
Original language name
Atomic layer deposition for coating of high aspect ratio TiO2 nanotube layers
Original language description
We present an optimized approach for the deposition of Al2O3 (as a model secondary material) coating into high aspect ratio (180) anodic TiO2 nanotube layers using the atomic layer deposition (ALD) process. In order to study the influence of the diffusion of the Al2O3 precursors on the resulting coating thickness, ALD processes with different exposure times (i.e., 0.5, 2, 5, and 10 s) of the trimethylaluminum (TMA) precursor were performed.n
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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