In situ monitoring of electrical resistance during deposition of Ag and Al thin films by pulsed laser deposition: comparative study
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F17%3A00478997" target="_blank" >RIV/68378271:_____/17:00478997 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.apsusc.2016.11.234" target="_blank" >http://dx.doi.org/10.1016/j.apsusc.2016.11.234</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.apsusc.2016.11.234" target="_blank" >10.1016/j.apsusc.2016.11.234</a>
Alternative languages
Result language
angličtina
Original language name
In situ monitoring of electrical resistance during deposition of Ag and Al thin films by pulsed laser deposition: comparative study
Original language description
In this study, the growth by pulsed laser deposition of thin films of nanometer thickness as well as clusters is presented. Two kinds of metals, namely Ag and Al, are investigated because of their different growth processes on SiO2. We show that by tuning the deposition rate and the background atmosphere, it is easily possible to obtain Ag clusters that exhibit plasmonic resonances at wavelengths shorter than 500 nm. It is further demonstrated that Al tends to perfectly wet the substrate when deposited under vacuum or gas pressure. In situ electrical resistance measurements are used to follow the growth during deposition, and conventional analysis techniques (AFM, SEM, absorption and ellipsometry spectroscopy) are used to control their properties.n
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Applied Surface Science
ISSN
0169-4332
e-ISSN
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Volume of the periodical
418
Issue of the periodical within the volume
Oct
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
5
Pages from-to
517-521
UT code for WoS article
000404495500016
EID of the result in the Scopus database
2-s2.0-85008162295