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Multi-layer reflective diffraction grating and use thereof

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F19%3A00537778" target="_blank" >RIV/68378271:_____/19:00537778 - isvavai.cz</a>

  • Result on the web

    <a href="https://worldwide.espacenet.com/patent/search/family/052991411/publication/EP3076208B1?q=EP3076208B1" target="_blank" >https://worldwide.espacenet.com/patent/search/family/052991411/publication/EP3076208B1?q=EP3076208B1</a>

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Multi-layer reflective diffraction grating and use thereof

  • Original language description

    The present invention provides a multi-layer dielectric/silicon (MLDS) reflective diffraction grating, comprising, in the following order: - a substrate, - at least one bi-layer Si / transparent dielectric material with a lower refractive index than Si, - optionally at least one bi-layer of first dielectric layer / second dielectric layer, wherein the first dielectric layer has a refractive index higher than the second dielectric layer, - a corrugated layer. The MLDS grating of the invention is suitable for in optical devices (e.g., lasers, spectrometers) using radiation wavelengths greater than 750 nm.nn

  • Czech name

  • Czech description

Classification

  • Type

    P - Patent

  • CEP classification

  • OECD FORD branch

    10306 - Optics (including laser optics and quantum optics)

Result continuities

  • Project

    <a href="/en/project/LQ1606" target="_blank" >LQ1606: ELI Beamlines: International Center of Excelence</a><br>

  • Continuities

    I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Others

  • Publication year

    2019

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Patent/design ID

    EP3076208

  • Publisher

    EPO_1 -

  • Publisher name

    European Patent Office

  • Place of publication

    Munich, The Hague, Berlin, Vienna, Brussels

  • Publication country

  • Date of acceptance

    Jun 12, 2019

  • Owner name

    Fyzikální ústav AV ČR, v. v. i

  • Method of use

    A - Výsledek využívá pouze poskytovatel

  • Usage type

    A - K využití výsledku jiným subjektem je vždy nutné nabytí licence