Voltammetric characterization of boron-doped diamond electrodes for electroanalytical applications
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F20%3A00536164" target="_blank" >RIV/68378271:_____/20:00536164 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.jelechem.2020.114020" target="_blank" >https://doi.org/10.1016/j.jelechem.2020.114020</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.jelechem.2020.114020" target="_blank" >10.1016/j.jelechem.2020.114020</a>
Alternative languages
Result language
angličtina
Original language name
Voltammetric characterization of boron-doped diamond electrodes for electroanalytical applications
Original language description
The boron-doped diamond (BDD) electrodes prepared by chemical vapor deposition on alumina substrates were electrochemically characterized by cyclic voltammetry. The influence was investigated of the boron dopant concentration, surface termination as well as chemical surface treatment on the kinetics of the electrode reaction. The effect of surface conditions of the boron-doped diamond electrodes on the kinetics of the electrodeposition of bismuth film was investigated for electrochemical applications in which bismuth film electrodes are utilized. A favourable effect of the cleaning procedures was proved, especially for the oxygen plasma-treated BDD electrode with a higher content of boron in alkaline solution. The anodic current response increased by 109% as compared with as-grown BDD. The effect of the quality of bismuth film on analytical performance of the voltammetric sensor was verified in simultaneous analysis of heavy metals (Pb, Cd and Zn) by anodic stripping voltammetry.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10406 - Analytical chemistry
Result continuities
Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2020
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Electroanalytical Chemistry
ISSN
1572-6657
e-ISSN
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Volume of the periodical
862
Issue of the periodical within the volume
Apr
Country of publishing house
CH - SWITZERLAND
Number of pages
9
Pages from-to
1-9
UT code for WoS article
000525903900035
EID of the result in the Scopus database
2-s2.0-85080956059