Understanding pulsed laser deposition process of copper halides via plasma diagnostics techniques
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F21%3A00560691" target="_blank" >RIV/68378271:_____/21:00560691 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1063/5.0077082" target="_blank" >https://doi.org/10.1063/5.0077082</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/5.0077082" target="_blank" >10.1063/5.0077082</a>
Alternative languages
Result language
angličtina
Original language name
Understanding pulsed laser deposition process of copper halides via plasma diagnostics techniques
Original language description
Due to the raised interest in copper halides for optoelectronic applications, a wide range of plasma diagnostic tools based on Langmuir probe (LP) and optical emission spectroscopy (OES) were implemented to investigate the pulsed laser deposition (PLD) process of selected copper halides. This represents the first report of complete diagnostics of copper halide plasma generated by laser ablation. High plasma potential and electron temperature were observed by a time-resolved LP analysis, which affected the kinetic energy of the ejected ions during expansion. The effect of argon gas addition on the copper halide plasma dynamics was investigated. Angle-resolved measurements revealed a narrow cone plasma expansion with a dual peak charge particle distribution, which was affected only above 2 Pa of Ar atmosphere.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
1089-7550
Volume of the periodical
130
Issue of the periodical within the volume
24
Country of publishing house
US - UNITED STATES
Number of pages
10
Pages from-to
243302
UT code for WoS article
000738923200004
EID of the result in the Scopus database
2-s2.0-85122366546