RF and DC plasma assisted laser deposition of a-CN x thin films.

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F99%3A02990464" target="_blank" >RIV/68378271:_____/99:02990464 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

RF and DC plasma assisted laser deposition of a-CN x thin films.

Original language description

Original scientific paper dealing with RF and DC plasma assisted laser deposition of a-CN x thin films.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/GA202%2F93%2F0464" target="_blank" >GA202/93/0464: Research of Processes of Laser Thin Film Deposition</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

1999

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Tenth International School on Quantum Electronics: Laser Physics and Applications.

ISBN

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ISSN

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e-ISSN

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Number of pages

5

Pages from-to

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Publisher name

SPIE - The International Society for Optical Engineering

Place of publication

Bellingham

Event location

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Event date

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Type of event by nationality

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UT code for WoS article

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