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Control of Process of Ion Implantation and Registration of Technological Parameters

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F10%3A00174782" target="_blank" >RIV/68407700:21220/10:00174782 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Control of Process of Ion Implantation and Registration of Technological Parameters

  • Original language description

    Program communicates to the control units of the e-gun and ion source and register values of process variables. The pressure, gases flow, and temperature are gained from the measurement of the analog values by the card NI6221. Information in the digitaland graphical form for the control of the implantation process is retrieved from the measured values. Program displays relations of the actual values and graphically displays their history. Program was created in the Borland C++ Builder environment.

  • Czech name

  • Czech description

Classification

  • Type

    R - Software

  • CEP classification

    JC - Computer hardware and software

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    Z - Vyzkumny zamer (s odkazem do CEZ)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Internal product ID

    ASW 2

  • Technical parameters

    Automatizace a registrace procesu využívajícího iontové a elektronové svazky

  • Economical parameters

    Nejsou stanoveny

  • Owner IČO

    68407700

  • Owner name

    České vysoké učení technické v Praze, Fakulta strojní