High-fluence Nitrogen Ion Implantation into Titanium and its Effects on Surface Saturation

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21220%2F24%3A00379179" target="_blank" >RIV/68407700:21220/24:00379179 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
High-fluence Nitrogen Ion Implantation into Titanium and its Effects on Surface Saturation
Original language description
High fluence nitrogen ion implantation into commercially pure titanium grade 2 was investigated. Nitrogen ions were implanted with fluences ranging from 1*1017 to 27*1017 cm-2 using an accelerating voltage of 90 kV. Here we present the influence of high nitrogen fluence on the structural changes of the nitride surface layer and the impact of nitrogen saturation on the surface properties. Several analytical techniques were used to assess the implanted surfaces, including atomic force microscopy for characterizing the surface morphology and roughness, glow discharge optical emission spectroscopy for analyzing nitrogen depth distribution, and nanoindentation for measuring nanomechanical properties. Our findings demonstrate that surface saturation with nitrogen was achieved in the examined interval of applied fluences. Blisters, craters, and cracks, typical signs of oversaturation, were observed. Oversaturation resulted in a reduction in surface hardness compared to titanium implanted with lower fluences.
Czech name
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Czech description
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Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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