Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F08%3A00151397" target="_blank" >RIV/68407700:21230/08:00151397 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge
Original language description
Influence of precursor (titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO2 thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Surface morphology of the thin TiO2 films deposited on glass substrates was studied by the atomic force microscopy (AFM) and water contact angle (CA) measurement.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Problems of Atomic Science and Technology. Series: Plasma Physics
ISSN
1562-6016
e-ISSN
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Volume of the periodical
48
Issue of the periodical within the volume
6
Country of publishing house
UA - UKRAINE
Number of pages
3
Pages from-to
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UT code for WoS article
000263031100056
EID of the result in the Scopus database
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