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Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F08%3A00151397" target="_blank" >RIV/68407700:21230/08:00151397 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Deposition of TiO2 Thin Films Using Atmospheric Dielectric Barrier Discharge

  • Original language description

    Influence of precursor (titanium tetraisopropoxide (TTIP)) temperature, precursor and gas flow rates on the surface properties of TiO2 thin films deposited by atmospheric dielectric barrier discharge (ADBD) chemical vapour deposition (CVD) were investigated. Surface morphology of the thin TiO2 films deposited on glass substrates was studied by the atomic force microscopy (AFM) and water contact angle (CA) measurement.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2008

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Problems of Atomic Science and Technology. Series: Plasma Physics

  • ISSN

    1562-6016

  • e-ISSN

  • Volume of the periodical

    48

  • Issue of the periodical within the volume

    6

  • Country of publishing house

    UA - UKRAINE

  • Number of pages

    3

  • Pages from-to

  • UT code for WoS article

    000263031100056

  • EID of the result in the Scopus database