Proton implantation in silicon: evolution of deep and shallow defect states
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21230%2F08%3A03144155" target="_blank" >RIV/68407700:21230/08:03144155 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Proton implantation in silicon: evolution of deep and shallow defect states
Original language description
The paper deals with formation of shallow and deep defects states appeared in FZ and CZ silicon after implantation with MeV protons and subsequent annealing.
Czech name
Implantace protonů do křemíku: vývoj hlubokých a mělkých poruch
Czech description
Článek se zabývá tvorbou mělkých a hlubokých poruch, které vznikly ve FZ a CZ křemíku po implantaci MeV protony a následném žíháni.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS
ISSN
1454-4164
e-ISSN
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Volume of the periodical
ISS.6-2008
Issue of the periodical within the volume
10
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
5
Pages from-to
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UT code for WoS article
000257086000014
EID of the result in the Scopus database
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