High Precision Matrix Laser Lithography for Fabrication of Novel Types of Optical Security Elements
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F11%3A00191048" target="_blank" >RIV/68407700:21340/11:00191048 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
High Precision Matrix Laser Lithography for Fabrication of Novel Types of Optical Security Elements
Original language description
Laser matrix lithography device is presented which can be used for fabrication of various diffractive structures including novel types of optical security elements. New ideas in encryptionof information using diffractive elements are presented.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BH - Optics, masers and lasers
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Proceedings of the OSA's 95th Annual Meeting, Frontiers in Optics (FiO) 2011 Conference
ISBN
978-1-55752-917-6
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
"FTuM2"
Publisher name
Optical Society of America
Place of publication
Washington, DC
Event location
San Jose
Event date
Oct 16, 2011
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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