Slumping of Si wafers at high temperature

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F13%3A00212409" target="_blank" >RIV/68407700:21340/13:00212409 - isvavai.cz</a>
Alternative codes found
RIV/60461373:22310/13:43896886
Result on the web
<a href="http://dx.doi.org/10.1117/12.2021586" target="_blank" >http://dx.doi.org/10.1117/12.2021586</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1117/12.2021586" target="_blank" >10.1117/12.2021586</a>

Result language
angličtina
Original language name
Slumping of Si wafers at high temperature
Original language description
Space X-ray imaging telescopes have delivered unique observations that have been significantly contributing to many important discoveries of current astrophysics. For future telescopes with a larger collecting area and a better angular resolution, the limiting factor is their X-ray reflecting mirror array. Therefore, for a successful construction of future lightweight and highly reflecting X-ray mirrors, new cost-effective technologies and progressive materials are needed. Currently, the very promisingmaterials are silicon foils which are commercially produced on a large scale. We focused on the plastic deformation of thin monocrystalline silicon foils, which was necessary for the precise thermal forming of the foils to 3D shapes. To achieve the plastic deformation, we applied forced slumping at temperatures from 1200 to 1400°C. The final shapes and the surface quality of the foils were measured using a Taylor Hobson contact profilometer and examined with an Atomic Forced Microscopy.
Czech name
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Czech description
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Project
<a href="/en/project/GA13-33324S" target="_blank" >GA13-33324S: Lobster Eye X-Ray Monitor</a><br>
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2013
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection
Proceedings of SPIE Vol. 8777 Damage to VUV, EUV, and X-ray Optics IV; and EUV and X-ray Optics: Synergy between Laboratory and Space III
ISBN
978-0-8194-9579-2
ISSN
0277-786X
e-ISSN
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Number of pages
7
Pages from-to
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Publisher name
SPIE
Place of publication
Bellingham (stát Washington)
Event location
Praha
Event date
Apr 15, 2013
Type of event by nationality
EUR - Evropská akce
UT code for WoS article
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