Laser-driven ion acceleration enhancement using silicon nitride plasma shutter

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68407700%3A21340%2F21%3A00353011" target="_blank" >RIV/68407700:21340/21:00353011 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Laser-driven ion acceleration enhancement using silicon nitride plasma shutter
Original language description
Plasma shutter in a form of a thin solid membrane provides a way for improving laser pulse contrast by mitigation of prepulses accompanying the main laser pulse. In contrast to other techniques, like plasma mirror, the laser pulse needs to burn through the overdense shutter. Although a part of the laser pulse energy may be lost during this process, the intensity profile can be improved. This includes local increase of intensity and generation of a steep-front laser pulse. The new pulse shape can improve the ion acceleration during the RPA phase and reduce development of short-wavelength instabilities in laser-matter interaction. In this work we study the utilisation of commercial silicon nitride membrane as the plasma shutter with the help of 3D particle-in-cell simulations using code EPOCH. In our simulations we demonstrate a substantial increase in maximal energy of heavy ions accelerated from the main foil, when a thin plasma shutter is added into the interaction with a PW-class laser pulse.
Czech name
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Czech description
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Project
<a href="/en/project/EF16_019%2F0000778" target="_blank" >EF16_019/0000778: Center for advanced applied science</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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