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733 (0,066s)

Result

Steady-state and time-resolved near-field optical spectroscopy of GaN/AlN quantum dots and InGaN/GaN quantum wells

Steady-state and time-resolved near-field optical spectroscopy of GaN/AlN quantum dots and InGaN/GaN quantum wells...

BM - Fyzika pevných látek a magnetismus

  • 2002
  • Jx
Result

Growth and properties of GaN and AlN layers on silver substrates

We report on the preparation and properties of GaN and AlN layers grown polycrystalline character of GaN with high preferential GaN (11-22) orientation. An intermetallic phase of Ga3Ag is found at the GaN/...

BM - Fyzika pevných látek a magnetismus

  • 2005
  • Jx
Result

Epitaxial multilayer structure for GaN-based high electron mobility transistors and a transistor containing this structure

semiconductors AlN and GaN. The binary semiconductors, and the interfaces between them, form by an AlN, or by an GaN layer. The barrier can contain one or multiple GaN/AlN pairs in nitride e-HEMT...

Condensed matter physics (including formerly solid state physics, supercond.)

  • 2019
  • P
  • Link
Result

Local increase in compressive strain (GaN) in gate recessed AlGaN/GaN MISHFET structures induced by an amorphous AlN dielectric layer

by applying amorphous AlN thin layers as a dielectric in gate recessed AlGaN/GaN to 0.3 GPa in GaN after gate recessing was experimentally determined. The local of 4 and 6 nm thin AlN layers in the gate recessed s...

Inorganic and nuclear chemistry

  • 2021
  • Jimp
  • Link
Result

Temperature effect on Al predose and AlN nucleation affecting the buffer layer performance for the GaN-on-Si based high-voltage devices

An AlN buffer layer allows epitaxial growth of GaN on silicon substrates. We have studied the early AlN nucleation stage performed at high and low process by a carbonization of the Si surface. Formation of the SiC interlaye...

Condensed matter physics (including formerly solid state physics, supercond.)

  • 2019
  • Jimp
  • Link
Result

Epitaxy film of AlN deposited in high-temperature MOCVD aparatus

SEM, XRD, XPS, analysis and Ellipsometry of epitaxy AlN film growth on saphire substrate by MOCVD method.

Condensed matter physics (including formerly solid state physics, supercond.)

  • 2018
  • Gfunk
  • Link
Result

Utility sample of final HEMT structure

ohm.cm (full substrate specification is W754B00). Our structure consists from AlN nucleation layer (1 nm of low temperature AlN @800°C, 260 nm of high temperature AlN doped AlN(5nm)/AlGaN(25 nm) superlattice with ...

JA - Elektronika a optoelektronika, elektrotechnika

  • 2016
  • Gfunk
Result

Final Product Specification for Thick Polished Wafers W7584B00 for GaN/AlN Epitaxial Growth

Specification of the substrate for the growth of GaN / AlN layers and functional sample substrate (for ideal growth nucleation layer) of silicon wafer with 150 mm in diameter, the optimized: thickness due to the deflection of the wa...

JJ - Ostatní materiály

  • 2015
  • Gfunk
Result

Temperature Dependence of the Pyroelectric Behaviour in GaN/AlGaN

So far the dependence of the spontaneous polarization coefficient for GaN and AlN on temperature has been measured to be minimal, which corresponds with expectation that the spontaneous polarization is reduced at the elevated temper...

JA - Elektronika a optoelektronika, elektrotechnika

  • 2010
  • D
Result

Proposal for nucleation

Technical report id TH02010014-2017V003, 29 pages, is focused on initialization of heteroepitaxial crystal growth of AlN on Si, including evaluation of layers optimization, alternative layers, influence of contamination by oxygen and relate...

Materials engineering

  • 2017
  • O
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