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Deposition of thin titanium-copper films with antimicrobial effect by advanced magnetron sputtering methods
The antibacterial effect of thin titanium-copper (Ti-Cu) films combined were prepared by three different plasma-assisted magnetron sputtering methods: direct current magnetron sputtering (dc-MS), dual magnetron
BM - Fyzika pevných látek a magnetismus
- 2011 •
- Jx •
- Link
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Výsledek na webu
Gas aggregation nanocluster source ? Reactive sputter deposition of copper and titanium nanoclusters
Copper and titanium nanoclusters in Ar and in Ar+O2 gas mixtures were prepared using a magnetron based gas aggregation cluster source designed for Ultra High Vacuum operation. A considerable influence of oxygen addition on the forma...
JJ - Ostatní materiály
- 2011 •
- Jx •
- Link
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Výsledek na webu
A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering
of copper and titanium measured by us during high-power pulsed dc magnetron sputteringWe present a phenomenological equilibrium model applicable to high-power pulsed dc magnetron sputtering with relatively long st...
BL - Fyzika plasmatu a výboje v plynech
- 2010 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Planar Heating Element Adjusted by Electron Beam Micromachining
This paper describes a planar heating element suitable for vacuum. The basis of this element is a ceramic plate with a thin layer of titanium deposited by magnetron sputtering. The copper contacts are brazed to the opposite...
JA - Elektronika a optoelektronika, elektrotechnika
- 2009 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Oxidation behavior of Cu nanoparticles embedded into semiconductive TiO2 matrix
Metal nanoparticles embedded into a semiconductive matrix represent a promising material for widely sought advanced technological applications. We focused our interest on the preparation of TiO2 matrix with embedded Cu nanoparticles. In particular, w...
Fluids and plasma physics (including surface physics)
- 2015 •
- Jimp •
- Link
Rok uplatnění
Jimp - Článek v periodiku v databázi Web of Science
Výsledek na webu
Suppressed hysteresis behaviour of titanium sputtering in acetylene gas.
This contribution deals with suppressed hysteresis behaviour of titanium sputtering in argon and acetylene mixture.
BL - Fyzika plasmatu a výboje v plynech
- 2009 •
- O
Rok uplatnění
O - Ostatní výsledky
Temporal evolution of sputtered species number densities in reactive HiPIMS with nitrogen admixture
of discharge current, voltage, pressure and ionization fraction of sputtered species in HiPIMS process is analyzed. The temporal evolution of an absolute number of sputtered titanium atom and ion density is estimated durin...
Fluids and plasma physics (including surface physics)
- 2019 •
- O
Rok uplatnění
O - Ostatní výsledky
High-power pulsed magnetron sputtering: Model and experiments
materials (copper and titanium) with very different characteristics. A completelyThe original model developed by Christie (2005) for high-power pulsed magnetron sputtering was modified. A weak additional ionization of ...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- D
Rok uplatnění
D - Stať ve sborníku
Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process
Analysis of the Transport of Ionized Titanium Atoms in a Highly Ionized Sputter Deposition Process...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Experimental study of hybrid PVD-PECVD process of titanium target sputtering in argon and acetylene
This contribution deals with the experimental study of hybrid PVD-PECVD process of titanium sputtering in argon and acetylene.
BL - Fyzika plasmatu a výboje v plynech
- 2011 •
- O
Rok uplatnění
O - Ostatní výsledky
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