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Reactive magnetron sputtering of hard Si-B-C-N films with a high-temperature oxidation resistance
Based on the results obtained for C-N and Si-C-N films, a systematic invetsigation of reactive magnetron sputtering of hard quaternary Si-B-C-N materials has be...
BL - Fyzika plasmatu a výboje v plynech
- 2005 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Thermal stability of magnetron sputtered Si-B-C-N materials at temperatures up to 1700 °C
Thermal stability of deposited Si-B-C-N materials (film fragments or powders + 75% Ar). It was found that the deposited Si-B-C-N materials can be more stable me...
BL - Fyzika plasmatu a výboje v plynech
- 2010 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Maximum achievable N content in atom-by-atom growth of amorphous Si–B–C–N materials
Amorphous Si–B–C–N alloys can combine exceptional oxidation resistance up to 1500 °C with high-temperature stability of superior functional properties. Because achievable N content in amorphous
Coating and films
- 2021 •
- Jimp •
- Link
Rok uplatnění
Jimp - Článek v periodiku v databázi Web of Science
Výsledek na webu
Effect of B and Si/C ratio on high-temperature stability of Si-B-C-N materials
Amorphous Si-B-C-N alloys were deposited by reactive magnetron sputtering and molecular-dynamics simulations. We show that both a higher Si/C ratio and the addition of boron improve the thermal st...
BL - Fyzika plasmatu a výboje v plynech
- 2006 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Hard Si-B-C-N films prepared by reactive magnetron sputtering
The ternary and quaternary materials containing Si, B, C and N have been attracting great interest due to their new features which can be used in microelectronics and coating technologies. The paper deals ...
BL - Fyzika plasmatu a výboje v plynech
- 2013 •
- O
Rok uplatnění
O - Ostatní výsledky
Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering
In this work, a systematic investigation of reactive magnetron sputtering of hard quaternary Si-B-C-N materials has been carried out. The Si-B-C-N films were deposited o...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- D
Rok uplatnění
D - Stať ve sborníku
Hard Amorphous Si-B-C-N Films with Ultra-High Thermal Stability in Air
Novel quaternary Si-B-C-N materials are becoming increasingly attractive. In the present work, amorphous Si-B-C-N films were deposited on Si and SiC substrates ...
BL - Fyzika plasmatu a výboje v plynech
- 2008 •
- D
Rok uplatnění
D - Stať ve sborníku
Effect of implanted argon of hardness of novel magnetron sputtered Si-B-C-N materials: experiments and ab initio simulations
The paper deals with Si-B-C-N alloys were deposited by reactive magnetron sputtering in nitrogen-argon gas mixtures. Material structure and resulting mechanical |Ub|) the material is practically h...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Bonding statistics and electronic structure of novel Si-B-C-N materials: Ab initio calculations and experimental verification
. The authors show a difference between Si-based and C-based Si_B-C-N networks, the authors calculate electronic structure and photoconductivity of the materials. The authors find that both a higher Si...
BL - Fyzika plasmatu a výboje v plynech
- 2007 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
High-temperature stability of the mechanical and optical properties of Si-B-C-N films prepared by magnetron sputtering
°C substrate limit. Furthermore, both Si-B-C-N materials studied here exhibited extremely high oxidation resistance in air up to the 1300°C substrate limit.Amorphous Si-B
BL - Fyzika plasmatu a výboje v plynech
- 2009 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
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