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Electronic device for electronically controled etching
This paper covers control board for electronically controled etching. This device is designed in order to analyze and control optimal cathode etching process. Main function of this control unit is to control position system, measure...
JA - Elektronika a optoelektronika, elektrotechnika
- 2004 •
- D
Rok uplatnění
D - Stať ve sborníku
System for wet etching of Si substrates
The device is designed for wet etching of silicon substrates. The sample is placed in one of the holders and immersed in a chemical bath where it is etched to the desired depth. The system automatically rotates with sample and check...
Polymer science
- 2017 •
- Gfunk
Rok uplatnění
Gfunk - Funkční vzorek
Control board for cathode etching
This paper covers control board for cathode etching. This device is designed in order to analyze and control optimal cathoed etching cycle. Main function of this control board is control position system, measure etching cur...
JA - Elektronika a optoelektronika, elektrotechnika
- 2004 •
- D
Rok uplatnění
D - Stať ve sborníku
Control unit for etching of cathodes
This paper covers control board for cathode etching. This device is designed in order to analyze and control optimal cathoed etching cycle. Main function of this control board is control position system, measure etching cur...
JA - Elektronika a optoelektronika, elektrotechnika
- 2004 •
- D
Rok uplatnění
D - Stať ve sborníku
SMV-2019-03: Thin membranes
The development of technology for preparation of very thin silicon nitride membrane for use in low energy electron spectroscopy. Several techniques for preparation of thin membranes were tested during the development – wet etching, reactive ...
Nano-processes (applications on nano-scale); (biomaterials to be 2.9)
- 2019 •
- Vsouhrn
Rok uplatnění
Vsouhrn - Souhrnná výzkumná zpráva
Plasmochemical Etching of Silicon in Diener Nano Device
This article deals with plasma etching of Si in a CF4/O2 mixture. This is a common way of Si etching used in micro- and nanofabrication. We determined important parameters such as etching rates and selectivity of Si and PMM...
JA - Elektronika a optoelektronika, elektrotechnika
- 2014 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Design of Setup for Laser Induced Plasma Etching
Plasma etching introduces a physically activated chemical process highly utilized in the semiconductor industry. However, for the creation of etched structures mask has to be prepared on top of the etched surfaces. This is ...
Optics (including laser optics and quantum optics)
- 2024 •
- D •
- Link
Rok uplatnění
D - Stať ve sborníku
Výsledek na webu
Local topography of optoelectronic substrates prepared by dry plasma etching process
In this work, the etch rate of silicon carbide and aluminum oxide were studied as a function of the angle etching material and flow of plasma. Al2O3 and SiC are important etching of Al2O3 and SiC wafers. The wafer slope for...
Electrical and electronic engineering
- 2015 •
- Jimp •
- Link
Rok uplatnění
Jimp - Článek v periodiku v databázi Web of Science
Výsledek na webu
Interferometric measuring system for deep reactive ion etching system
The device is designed to accurately measure the depth of etching in a deep reactive etching system. Measurements can be made in real time, allowing you to stop the etching process after reaching a certain depth of etch...
Optics (including laser optics and quantum optics)
- 2017 •
- Gfunk
Rok uplatnění
Gfunk - Funkční vzorek
Tip etching station
The device for tip etching was developed and constructed. Mechanical part consists of tip holder, beaker with etching solution and capillary for micro-polishing. There are three orthogonal micro-manipulators for the precise tip posi...
BM - Fyzika pevných látek a magnetismus
- 2014 •
- Gfunk •
- Link
Rok uplatnění
Gfunk - Funkční vzorek
Výsledek na webu
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