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Microwave plasma ion sources for selected ion flow tube mass spectrometry: Optimizing their performance and detection limits for trace gas analysis
and detection limits for trace gas analysis. The microwave discharge plasma ion sourceThe performance of the ion sources used in selected ion flow tube mass for SIFT-MS is described, and...
CF - Fyzikální chemie a teoretická chemie
- 2007 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Energy distribution functions of ions impinging on substrate in microwave plasma
Energy distribution functions of ions impinging on substrate in microwave plasma...
BL - Fyzika plasmatu a výboje v plynech
- 2004 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Production of highly charged heavy ions by means of a hybrid source in DC mode and in afterglow mode
The preliminary results of the ECLISE experiment, which couples a laser ion source with an ECR ion source, are presented. An ion current was enhanced of about one order of magnitude for the 30 Hz repetitio...
BL - Fyzika plasmatu a výboje v plynech
- 2005 •
- D
Rok uplatnění
D - Stať ve sborníku
Chromatic monitoring of downstream microwave plasma source.
The application of the chromatic sensing for monitoring of a microwave plasma source is described. The emitted radiation from the plasma excited in the argon, oxygen and CF4 mixture was measured with three PIN-......
JB - Senzory, čidla, měření a regulace
- 2000 •
- D
Rok uplatnění
D - Stať ve sborníku
Chromatic monitoring of downstream microwave plasma source
The application of the chromatic sensing for monitoring of a microwave plasma source is described. The emitted radiation from the plasma excited in the argon, oxygen and CF4 mixture was measured with three PIN-......
JB - Senzory, čidla, měření a regulace
- 2000 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Plasma Diagnostic for Development and Optimization of Plasma Activated Deposition Processes
Application of plasma diagnostic for process development is described. The electron and/or ion density is shown to be a proper parameter for plasma on development of large-scale plasma polymerization process and on...
BL - Fyzika plasmatu a výboje v plynech
- 2004 •
- Jx
Rok uplatnění
Jx - Nezařazeno - Článek v odborném periodiku (Jimp, Jsc a Jost)
Proceedings of 46th EPS Conference on Plasma Physics: Determination of electron density in microwave plasma torch by microwave interferometry
The classical microwave diagnostics of typical filamentary plasma requires high frequency microwave source. This work investigates the employment of using 34.5 GHz microwave interferometry (for which the <...
Fluids and plasma physics (including surface physics)
- 2019 •
- D
Rok uplatnění
D - Stať ve sborníku
Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma
A plasma-assisted atomic layer deposition system employing a microwave surfatron plasma was developed and characterized by spatially resolved Langmuir probe electrode serving as a source of weak radio frequency
Fluids and plasma physics (including surface physics)
- 2021 •
- Jimp •
- Link
Rok uplatnění
Jimp - Článek v periodiku v databázi Web of Science
Výsledek na webu
Optimized surfatron plasma source for PE-ALD deposition system
Within the TAČR project, we developed and implemented a microwave plasma-jet source in two configurations called a surfatron suitable for use in the Minimal Fab source is able to generate low-temperature plasma...
Fluids and plasma physics (including surface physics)
- 2020 •
- Gfunk
Rok uplatnění
Gfunk - Funkční vzorek
Diagnostics of Surfatron-generated Plasma by Probe Measurements and Emission Spectroscopy.
of a microwave plasma source in these areas. The diagnosed microwave?driven plasma source conssts of a surfatron powered by a microwave magnetron generator, working at 2.45 GHz in the ou...
BL - Fyzika plasmatu a výboje v plynech
- 2004 •
- D
Rok uplatnění
D - Stať ve sborníku
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