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High- tech energy beams technologies for deposition and treatment of films for electronics production.

Project goals

Advanced technologies for microelectronics and sensorics based on the combination of the high-tech energy beams technologies (laser beams, ion beams, UV light and microwavw exposures) and those of micro- and nano-films deposited by vacuum, plasma and wetprocesses as well. The selectivity of processes accompanied by a high resolution of lines and gaps of the film structures is of primary importance in the development.

Keywords

microelectronicssensoricslaser beamion beamUV lightmicrowavesmisro-filmsnano-filmsplasmavacuum depositionwet deposition

Public support

  • Provider

    Ministry of Industry and Trade

  • Programme

    TANDEM

  • Call for proposals

    TANDEM 2 (SMPO200500008)

  • Main participants

  • Contest type

    VS - Public tender

  • Contract ID

    FT-TA2/018

Alternative language

  • Project name in Czech

    Pokročilé svazkové technologie vytváření a zpracování vrstev pro výrobní praxi v elektronice.

  • Annotation in Czech

    Pokročilé technologie pro mikroelektroniku a senzoriku založené na kombinaci technologií energetických svazků (laser, UV záření, iontové svazky, mikrovlnné záření apod.) a technologií mikro- a nano-vrstev nanášených vakuovými technikami, plasmatickými technikami i mokrými procesy. Důraz je kladen na selektivitu procesů s výrazně vysokým rozlišením šířky drah a mezer vytvářených struktur.

Scientific branches

  • R&D category

    PV - Industrial research

  • CEP classification - main branch

    JH - Ceramics, fire-proof materials and glass

  • CEP - secondary branch

    JA - Electronics and optoelectronics

  • CEP - another secondary branch

  • 20201 - Electrical and electronic engineering
    20504 - Ceramics

Completed project evaluation

  • Provider evaluation

    U - Uspěl podle zadání (s publikovanými či patentovanými výsledky atd.)

  • Project results evaluation

    High energy beams technologies (laser beams, ion beams, UV light and microwave exposures, sputtering and ion etching, plasma processing), nano- and micro- films deposition, their integration on alumina substrates, applied on HIC and sensor modules.

Solution timeline

  • Realization period - beginning

    Jul 26, 2005

  • Realization period - end

    Dec 31, 2008

  • Project status

    U - Finished project

  • Latest support payment

    May 7, 2008

Data delivery to CEP

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

  • Data delivery code

    CEP09-MPO-FT-U/02:2

  • Data delivery date

    Apr 14, 2010

Finance

  • Total approved costs

    20,642 thou. CZK

  • Public financial support

    13,215 thou. CZK

  • Other public sources

    0 thou. CZK

  • Non public and foreign sources

    7,427 thou. CZK

Basic information

Recognised costs

20 642 CZK thou.

Public support

13 215 CZK thou.

64%


Provider

Ministry of Industry and Trade

CEP

JH - Ceramics, fire-proof materials and glass

Solution period

26. 07. 2005 - 31. 12. 2008